PVD Titanium Target

PVD Titanium Target

We specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45, 95×40, 95×45, 80×50, etc. A full range of materials are available: titanium targets, chromium targets, titanium-aluminum targets (ratios 7:3, 8:2, 5:5), and zirconium targets (Zr702).
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Description

PVD Titanium Target is a titanium source for physical vapor deposition systems producing metallic or reactive coatings. It may take the form of a compact multi-arc cathode, a planar sputtering disc or plate, or another equipment-specific source component. Titanium supplies the deposited metal, while process gas and the qualified chamber recipe shape the resulting film. This makes the target useful in coating programs that have already selected titanium and now need a repeatable consumable with the right material identity, erosion face, mounting geometry, and heat-transfer interface.

The deposition method has to be named before the target can be defined. Arc sources carry current and heat through a cathode construction that differs from a planar sputter target clamped or bonded against a cooled backing. A visible face diameter cannot reveal rear stems, threads, shoulders, contact lands, backing plates, or exclusion zones. The buying task is to reproduce the approved interface without copying wear from a spent cathode, then protect the working surface and records until installation. Film color, hardness, adhesion, and rate remain outcomes of the complete coating process rather than standalone attributes of the titanium target.

Machined circular titanium sputtering target with a planar working face
This verified titanium sputtering target represents the planar source route discussed on this page.

Arc Cathode or Planar Sputter Target?

A multi-arc cathode is typically released as a compact source part with a front erosion area and equipment-specific features behind it. The drawing may contain a stem, thread, taper, shoulder, clamp land, or cooling contact that is invisible from the chamber side. Electrical and thermal contact are integral to its installation. Provide the clean pocket or cathode reference along with the target drawing so the rear geometry can be checked as carefully as the face.

A planar sputtering source spreads the working area across a disc or plate. Its outline, thickness, edge profile, rear flatness, clamp zone, backing construction, and bond coverage become the main physical controls. A source described only as PVD titanium may fit either route in casual conversation, but the two forms should never share an uncontrolled purchase line.

FeatureMulti-arc sourcePlanar sputter source
Primary interfaceRear cathode features and electrical contactClamp or backing contact over a defined area
Drawing focusStem, thread, shoulder, face, and seating surfacesOutline, thickness, edge, rear face, and mounting zones
Assembly choiceBare cathode piece or defined mounted partMonolithic target or backed construction
First installation checkSeat, current path, cooling contact, and arc conditioningFlat contact, clamps, bond condition, and sputter conditioning

Recover Original Dimensions From the Right Evidence

The best dimensional source is a revision-controlled equipment or target drawing. An unused accepted part can provide secondary confirmation. A spent target ranks lower because erosion reduces thickness, rounds edges, and can distort the rear face after repeated thermal cycles. If no drawing is available, identify areas protected by clamps or pockets, document wear zones, and compare measurements with the cathode owner's nominal interface before releasing manufacture.

Dimensions should distinguish the erosion face from functional rear contacts. State datums for total thickness, locating diameters, threaded depth, shoulders, mounting holes, and contact flatness where they matter. Mark any allowance intended for final fitting. Trial fitting in a clean, unpowered cathode is a sensible checkpoint for a newly reconstructed design.

Titanium Identity Follows the Qualified Recipe

The order should name the titanium grade, composition basis, or governing material requirement approved by the coating program. A request for pure titanium is incomplete if specific trace elements influence the established film. List only the chemistry controls that have technical value and state whether the certificate reports actual values or conformity. If an internal designation is used, attach its composition rather than expecting an outside party to interpret local shorthand.

A change in purity or titanium grade is a process change even when the part fits perfectly. Introduce it through the same qualification logic used for a new geometry. Titanium can support metallic deposition and reactive operation, but the gas mixture, pressure, power, bias, substrate preparation, chamber state, and temperature determine what forms on the substrate.

Rear Contact Controls More Than Fit

Heat must leave the titanium through the contact arrangement intended by the cathode. For a monolithic arc target, the rear seat or cooling feature may be machined directly into the part. For a planar design, heat may pass through rear contact, a backing plate, or a joined interface. Identify these functional zones on the drawing and give them measurable surface and geometry requirements. A part can enter the clamp while making poor thermal contact over the area that matters.

Where a backing plate is included, define its material, dimensions, ownership, and whether it is new or returned. A customer-owned plate needs inspection after the previous target is removed. Bonding or joining scope should state the required coverage and assessment route used by the approved design. Coolant flow, seals, fastening force, interlocks, and installation practice remain with the equipment owner and should be verified during commissioning.

Related titanium aluminum sputtering target shown as a different PVD source chemistry
This TiAl target is a related PVD source, not elemental titanium; it illustrates why target geometry and deposited chemistry are separate choices.

Condition the Working Face Under a Stable Recipe

Specify the face as an observable machined or prepared condition supported by prior process experience. Separate it from mounting surfaces and edges, which may require different treatment. Edge breaks, permitted machining marks, loose-particle control, and prohibited residues are useful when stated clearly.

Qualify a new target with the normal clean installation and a recorded conditioning ramp. Keep chamber maintenance state, process gas, substrate, power sequence, and other major variables stable. Observe arc events or sputter stability, erosion development, temperature or cooling indications available to the line, and the coating tests already used for release. This separates a target-related change from simultaneous shifts in chamber preparation or recipe.

For standard sputter-source context, see the Titanium Sputtering Target. When the released film requires a titanium-aluminum source instead of elemental titanium, the TiAl Sputtering Target is the relevant catalog route. Matching hardware does not make the chemistries substitutes.

Questions for PVD Titanium Target Selection

How can we tell whether the request is for an arc or sputter target?

Identify the deposition method, cathode model, mounting arrangement, and rear interface. Arc cathodes and planar sputter sources use different physical architectures even when both present a round face.

Can a worn target be used as the manufacturing master?

It can contribute interface information, but erosion and thermal history may have altered key surfaces. Pair it with equipment documentation and use protected features to reconstruct the original design.

Is a backing plate part of every PVD titanium target?

No. Some sources are monolithic; others rely on a backed construction. The cathode design determines the choice, and the order must identify backing material, joining, ownership, and inspection when included.

Does a higher-purity titanium target guarantee better adhesion?

No. Adhesion also depends on substrate condition, cleaning, chamber background, deposition settings, coating architecture, and testing. Purity changes should address a demonstrated source-material concern.

What should receiving inspect before installation?

Check identity, records, package condition, drawing revision, critical dimensions, contact faces, mounting details, working surface, and any backed or joined assembly evidence specified by the order.

Protect the Cathode-Ready Condition

Pack targets so working faces cannot rub, edges cannot strike the case, and rear contacts remain free from dents or transferred residue. Heavy pieces need rigid restraint at robust areas rather than pressure on an erosion edge. Labels should retain titanium identity, heat or lot, part number, drawing revision, and assembly reference through receiving. A complete request includes deposition method, equipment model, material basis, controlled drawings, quantity, surface definition, backing boundary, inspection documents, packaging, destination, and timing. For repeat work, include the last accepted revision and describe any unusual erosion or thermal event observed in service.

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