Refractory Metal Sputtering Targets

• High Purity Sputtering Target

  Our high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...

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• Zirconium Sputtering Target

  Zirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...

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• Chromium Sputtering Target

  Chromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...

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• Molybdenum Sputtering Target

  Molybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...

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• Zirconium Target

  Purity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...

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• Tungsten Target

  Our company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...

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• Tantalum Target

  A tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...

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