Zirconium Sputtering Target

Zirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges are available: Circular Zirconium Targets (Mainstream Size) Diameter: 2 inches (50.8 mm) — Minimum commonly used size, suitable for small experimental equipment and precision coating systems 3 inches (76.2 mm) — Standard size in the semiconductor and optical coating industries, widely used in magnetron sputtering equipment 4 inches (101.6 mm) — Mainstream size for industrial mass production, balancing efficiency and cost 6 inches (152.4 mm) — Commonly used in high-throughput production, suitable for large-area coating needs φ200 mm – φ600 mm — Supported large-size customization options, often used in specialized fields such as solar energy and display panels. Thickness: 3 mm – 10 mm — The most common thickness range, balancing material utilization and sputtering uniformity. 12 mm – 40 mm — For high-power or long-life applications, such as research-grade or continuous production systems. Rectangular/Planar Targets Size Range: 100 mm × 30 mm — Small rectangular targets commonly used in laboratory research. 200 mm × 50 mm to 500 mm × 150 mm — Industrial-grade planar targets, suitable for large PVD equipment. Thickness: Typically 5 mm – 15 mm, adjusted according to substrate size and sputtering uniformity requirements. Customization available according to drawings, including: Irregular contours (ring, ellipse, fan-shaped) Special thicknesses (<2 mm ultra-thin targets or >50 mm thick targets) Surface treatments (glossy finish, acid-washed finish, Ra1.6μm polished)