China tantalum foil Manufacturers Factory Suppliers
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Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
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TiAl Sputtering TargetChina manufacturer of Titanium Aluminum Sputtering Targets for PVD hard coating, decorative coating, tooling, automotive and industrial applications. Custom TiAl composition, size, purity, bonding...read more
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High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
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PVD Titanium TargetWe specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45,...read more
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Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
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Nitinol Sputtering TargetOur products are clearly marked as meeting the ASTM F2063-18 standard, and the nickel content range and phase transition temperature parameters (such as As value) are strictly controlled for...read more
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Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
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Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
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Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
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Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
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Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
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Titanium Sputtering TargetTitanium target is an important material used in physical vapor deposition technology, which is widely used in microelectronics, optics, semiconductor and other fields. Its main function is to...read more
Tantalum foil is processed on the basis of the tantalum sheet, roll the tantalum sheet further with the high precision rolling mill....
Description The thickness of tantalum foil is usually 0.01~0.1mm, Tantalum foil is processed on the basis of the tantalum strip, roll the tantalum sheet further with the high precision rolling mill....
Tantalum Foil / Strip has good plasticity. It can be processed through cold forging, rolling, punching, pulling, spinning, extrusion, bending and other processing method. Hot working needs to be done...
Tantalum foil, 1m coil, thickness 0.006mm, 99.9%; CAS Number: 7440-25-7; Synonyms: Tantalum,TA000260,Ta; find -GF24066525 MSDS, related peer-reviewed papers, technical documents, similar products &...
Tantalum Strip and Foil Unalloyed Tantalum is supplied to ASTM F560 – R05200 composition limits. Tantalum is selected for its corrosion resistance, thermal conductivity, high melting point, and...
Tantalum - Foil. Tantalum was discovered in 1802 by A.G. Ekeberg in Uppsala, Sweden. Tantalum is a shiny, silvery colored metal which is heavy, dense, malleable and ductile when pure. It is found in...
