China tantalum metal Manufacturers Factory Suppliers
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Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
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High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
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Rotary Sputtering TargetRotary Target Technical Specification – Semiconductor Grade Material & Purity Base Materials: Cu, Ta, Co, Ru, W, TiN, TaN (5N–6N purity: 99.999%–99.9999%) Impurity Limits: Oxygen: < 20...read more
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PVD Titanium TargetWe specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45,...read more
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Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
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Nitinol Sputtering TargetOur products are clearly marked as meeting the ASTM F2063-18 standard, and the nickel content range and phase transition temperature parameters (such as As value) are strictly controlled for...read more
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Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
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Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
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Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
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Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
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Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
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Titanium Sputtering TargetTitanium target is an important material used in physical vapor deposition technology, which is widely used in microelectronics, optics, semiconductor and other fields. Its main function is to...read more
WebASTM B365, 2012 Edition, December 1, 2012 - Standard Specification for Tantalum and Tantalum Alloy Rod and Wire This specification covers unalloyed and alloyed tantalum...
WebASTM-B365 Standard Specification for Tantalum and Tantalum Alloy Rod and Wire - chemistry; mechanical properties; tantalum; tantalum alloy; ASTM-B365 | Standard...
WebNov 18, 2019 · Abstract. This specification covers unalloyed and alloyed tantalum rod and wire. The materials covered are: R05200, R05400, R05255, R05252, and R05240....
WebTantalum rod and wire with excellent corrosion resistance. Application: electronics, chemical plant construction, aerospace, implants, superconductors Related Standards...
WebSpecifications: As per ASTM B365; Pure: Min 99.9% Tantalum; Minimum order quantity: 3 pieces; Process: Forging, Swaging, Drawing, etc. Diameter: 6~φ240mm, Length:...
WebJun 12, 2023 · 5.2 The various tantalum mill products covered by this speciÞcation are formed with the conventional extrusion, forming, swaging, rolling, and drawing equipment...
