China tantalum plate Manufacturers Factory Suppliers
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Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
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TiAl Sputtering TargetChina manufacturer of Titanium Aluminum Sputtering Targets for PVD hard coating, decorative coating, tooling, automotive and industrial applications. Custom TiAl composition, size, purity, bonding...read more
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High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
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Rotary Sputtering TargetRotary Target Technical Specification – Semiconductor Grade Material & Purity Base Materials: Cu, Ta, Co, Ru, W, TiN, TaN (5N–6N purity: 99.999%–99.9999%) Impurity Limits: Oxygen: < 20...read more
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Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
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Nitinol Sputtering TargetOur products are clearly marked as meeting the ASTM F2063-18 standard, and the nickel content range and phase transition temperature parameters (such as As value) are strictly controlled for...read more
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Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
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Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
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Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
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Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
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Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
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Titanium Sputtering TargetTitanium target is an important material used in physical vapor deposition technology, which is widely used in microelectronics, optics, semiconductor and other fields. Its main function is to...read more
tantalum plate is used in chemical process equipment, cathodic protection systems for steel structures such as bridges, water tanks, prosthetic devices for humans such as hips, plates in the skull,...
We provide tantalum plate with the following dimensions and specifications: Specification: ASTM B708 Material: R05200, R05400, Ta-Nb3, Ta-Nb20, Ta-2.5W (R05252), Ta-10W Size: 5.0-10.0mm Thick x...
Jul 24, 2020 · Tantalum plates are used in wide range of industries. In each of these applications, the tantalum has certain properties that are more critical than others. That is why it is essential...
Tantalum Sheet / Plate applications Tantalum Sheet and Tantalum Plate can be used in metallurgical industry to make heating parts, heat insulation parts and charging apparatus of vacuum high...
We provide Ta plate with following dimensions and specifications: Specification: ASTM B708 Material: R05200, R05400, Ta-Nb3, Ta-Nb20, Ta-2.5W (R05252), Ta-10W Size: 3.0-10.0mm Thick x 30-1000mm width...
Available Sizes for Tantalum Sheet & Plate Thickness .001″ .002” to .009” .010″ to .090″ .100″ and up Maximum Width 6″ 12″ 25″ 39″ Common Specifications ASTM B708 R05200 » Electron...
