China tantalum price Manufacturers Factory Suppliers
Our quality material tantalum, tellurium tantalum, tantalum material and attentive service help increase sales and enhance our corporate image. Our company specializes in one-stop service for the whole industry chain of tantalum price, and its business scope covers the whole country and goes international. Cohesion is the primary feature of our corporate culture character connotation, cohesion makes the enterprise collectively generate strength and make the enterprise structure stable. Stable structure, coupled with collective strength, is the guarantee for the enterprise to win in the market. Integrity, innovation, sharing and win-win are our core values! We strive to be the industry leader! It is not difficult to improve customer loyalty, maintain good customer relationship and provide good customer service. At the same time of self-development, we also take industry serving the country as our own responsibility and actively contribute to social progress. Combined with the trend of market and environment, we constantly inspire innovation inspiration and realize brand commitment.
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Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
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TiAl Sputtering TargetChina manufacturer of Titanium Aluminum Sputtering Targets for PVD hard coating, decorative coating, tooling, automotive and industrial applications. Custom TiAl composition, size, purity, bonding...read more
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High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
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Rotary Sputtering TargetRotary Target Technical Specification – Semiconductor Grade Material & Purity Base Materials: Cu, Ta, Co, Ru, W, TiN, TaN (5N–6N purity: 99.999%–99.9999%) Impurity Limits: Oxygen: < 20...read more
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PVD Titanium TargetWe specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45,...read more
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Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
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Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
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Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
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Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
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Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
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Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
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Titanium Sputtering TargetTitanium target is an important material used in physical vapor deposition technology, which is widely used in microelectronics, optics, semiconductor and other fields. Its main function is to...read more
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