China tungsten foil Manufacturers Factory Suppliers
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Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
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TiAl Sputtering TargetChina manufacturer of Titanium Aluminum Sputtering Targets for PVD hard coating, decorative coating, tooling, automotive and industrial applications. Custom TiAl composition, size, purity, bonding...read more
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High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
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Rotary Sputtering TargetRotary Target Technical Specification – Semiconductor Grade Material & Purity Base Materials: Cu, Ta, Co, Ru, W, TiN, TaN (5N–6N purity: 99.999%–99.9999%) Impurity Limits: Oxygen: < 20...read more
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PVD Titanium TargetWe specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45,...read more
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Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
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Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
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Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
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Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
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Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
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Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
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Titanium Sputtering TargetTitanium target is an important material used in physical vapor deposition technology, which is widely used in microelectronics, optics, semiconductor and other fields. Its main function is to...read more
High Density Machinable Tungsten Alloy foil is typically supplied to meet the requirements of ASTM-B-777 Class 1, 2, 3, and 4, MIL-T-21014, AMS-T-21014, AMS 7725 Type 1 and Type 2....
Tungsten foil is used to make heat shielding, heating element and carrier of the vacuum furnace. It is because tungsten foils process a high heat resistance in...
Tungsten foil is typically supplied to meet the requirements of ASTM-B-760. Upon request, Eagle Alloys Corporation can supply Tungsten foil per AMS 7897, AMS 7898. Tungsten has the...
Tungsten - Foil. Tungsten was isolated in 1783 by J.J. and F. Ehuijar in Vergara, Sweden. Tungsten metal is lustrous and silvery white in color, and does not occur naturally (it has an...
About Tungsten Foil. American Elements specializes in producing Tungsten High Purity Foil and sheets in many thicknesses and sizes for numerous industrial uses and provides health and...
Tungsten foil, thickness 0.05 mm, ≥99.9% trace metals basis; CAS Number: 7440-33-7; EC Number: 231-143-9; Synonyms: W; find Sigma-Aldrich-267538 MSDS, related peer-reviewed...
