China niobium and tantalum Manufacturers Factory Suppliers
-
Tantalum TargetA tantalum target is a target made of tantalum metal that is commonly used in a variety of physics experiments, materials science research, and industrial applications. Tantalum target has the...read more
-
TiAl Sputtering TargetChina manufacturer of Titanium Aluminum Sputtering Targets for PVD hard coating, decorative coating, tooling, automotive and industrial applications. Custom TiAl composition, size, purity, bonding...read more
-
High Purity Sputtering TargetOur high purity sputtering targets are the core source material for physical vapor deposition (PVD) and magnetron sputtering processes, engineered to meet the most stringent requirements of global...read more
-
Rotary Sputtering TargetRotary Target Technical Specification – Semiconductor Grade Material & Purity Base Materials: Cu, Ta, Co, Ru, W, TiN, TaN (5N–6N purity: 99.999%–99.9999%) Impurity Limits: Oxygen: < 20...read more
-
PVD Titanium TargetWe specialize in manufacturing PVD multi-arc coated titanium sputtering targets, with ample stock available. Main target specifications include: 100×40, 100×45, 98×40, 98×45,...read more
-
Zirconium Sputtering TargetZirconium sputtering targets typically come in various sizes depending on the application, equipment compatibility, and manufacturing process. The following standardized and customized size ranges...read more
-
Nitinol Sputtering TargetOur products are clearly marked as meeting the ASTM F2063-18 standard, and the nickel content range and phase transition temperature parameters (such as As value) are strictly controlled for...read more
-
Chromium Sputtering TargetChromium (Cr) is a metallic element with high hardness, high melting point and oxidation resistance, and the production of chromium targets is a precise and complex process. Chrome target shape:...read more
-
Titanium Aluminum TargetElement: TiAl Purity: 2N8 Shape: flat target Specification: 1Kg Packing: Three-layer vacuum packing or argon filled protection, in line with IATA, DOT packaging specificationsread more
-
Molybdenum Sputtering TargetMolybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum high temperature...read more
-
Zirconium TargetPurity of zirconium target: 99.7%~99.999%; Applications: Optical coating industry, tool and decorative coating industry. Zirconium rotating target using vacuum melting process, can produce a...read more
-
Tungsten TargetOur company specializes in the development and processing of tungsten, molybdenum, tantalum, niobium and other non-ferrous metal materials. With advanced testing equipment, the adoption of...read more
WebJan 3, 2017 · The slow activity of cathode materials is one of the most significant barriers to realizing the operation of solid oxide fuel cells below 500 °C. Here we report a niobium and...
WebNiobium and tantalum are transition metals almost always paired together in nature. These “twins” are difficult to separate because of their shared physical and chemical properties. In 1801,...
WebNov 25, 2017 · Niobium occurs associated with tantalum in the mineral columbite [ (Fe, Mn)O. (Nb, Ta) 3 O 5 ], which has been considered the most important source of...
WebNiobium is roughly 10 times more abundant in the crust of the Earth than is tantalum. Niobium, more plentiful than lead and less abundant than...
WebBoth are rare earth elements. Tantalum now sits below niobium in the periodic table. It has an atomic number of 73, and an atomic weight of just under 181. It always takes a valence of 5, so, for...
WebBoth niobium and tantalum are found together in the mineral columbite, a mixed oxide that also contains iron and manganese, and they have similar chemical and physical...
